Fabrication of N-level binary optical elements by use of M mask patterns with N in the range of 2^M-1 + 1 ≤ N ≤ 2^M
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Published:1998-12-01
Issue:34
Volume:37
Page:8012
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ISSN:0003-6935
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Container-title:Applied Optics
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language:en
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Short-container-title:Appl. Opt.
Publisher
The Optical Society
Cited by
8 articles.
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