Characteristic of fixed abrasive polishing for KDP in an anhydrous environment

Abstract

High grade optical components are rapidly being employed in a wide range of applications due to their great performance. Among these, KDP (potassium dihydrogen phosphate) is the preferred choice for frequency doubling components because to its large non-linear optical technique and high laser damage threshold. In this research, KDP is treated employing fixed polishing in an anhydrous environment. Copper oxide is utilized as abrasive, and toner and phenolic resin are combined to form pellets for KDP polishing. Calculation of the temperature field on the surface of the workpiece based on the relationship of the movement. The ideal polishing parameters are also determined from the findings of the temperature field and the optimum process parameters are 5kPa pressure, 150rpm and 8mm eccentricity. A new material removal model is presented and based on this, a unique processing technique to increase the material removal depth is provided. Interestingly, with this form of polishing, the surface roughness of the workpiece remains about Ra 20nm after a quick shift and does not alter with re-pressing.