Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing-Reference-Cited by-同舟云学术

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Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing

Published:2018-07-02 Issue:20 Volume:57 Page:5657
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Liang Shangjuan,Jiao Xiang,Tan Xiaohong,Zhu Jianqiang

Funder

Chinese Academy of Sciences (CAS)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference23 articles.

1. Hundred-Joule-level, nanosecond-pulse Nd:glass laser system with high spatiotemporal beam quality

2. Structural Stability of CaCuMn 6 O 12 under High Pressure and Low Temperature

3. Chemical effect on the material removal rate in the CMP of silicon wafers

4. Removal rate and surface quality of the GLSI silicon substrate during the CMP process

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2. Particle size distribution measurements of widely distributed carbonyl iron powder particles in concentrated suspensions using ultrasonic attenuation;Measurement Science and Technology;2023-04-24

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4. Development of novel multi-selective slurry with mechanically driven etching for through silicon via chemical mechanical polishing;Materials Science in Semiconductor Processing;2022-12

5. Polishing performance of a magnetic nanoparticle-based nanoabrasive for superfinish optical surfaces;Applied Optics;2022-06-07

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