Kinematic model for material removal distribution and surface figure in full-aperture polishing-Reference-Cited by-同舟云学术

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Kinematic model for material removal distribution and surface figure in full-aperture polishing

Published:2018-01-23 Issue:4 Volume:57 Page:588
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Liao Defeng,Ren Lele,Zhang Feihu,Wang Jian,Xu Qiao

Funder

China Academy of Engineering Physics (CAEP)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference12 articles.

1. Inertial-confinement fusion with lasers

2. Deterministic measurement and correction of the pad shape in full-aperture polishing processes

3. The characteristics of optics polished with a polyurethane pad

4. Investigation of nonuniform surface properties of classically manufactured fused silica windows

5. Parametric smoothing model for visco-elastic polishing tools

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1. Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing;2024-04-17

2. Kinematics and trajectory analysis of swinging fixed abrasive plane lapping: Effect of swinging mode on the lapping uniformity;Precision Engineering;2024-03

3. Comparison of Different Optical Measurement Methods in the Evaluation of the Wear of Sls-Fabricated Tool Used for Free Abrasive Machining;2024

4. Modelling and prediction of surface textures after abrasive machining processes: A review;Measurement;2023-10

5. Trajectory uniformity in fixed abrasive plane lapping of BK7 glass;The International Journal of Advanced Manufacturing Technology;2023-09-25

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