Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference28 articles.
1. Lithography gets extreme
2. Development of stable extreme-ultraviolet sources for use in lithography exposure systems
3. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition
4. EUV multilayer optics
5. Multilayer Zr/Si filters for EUV lithography and for radiation source metrology
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