Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model-Reference-Cited by-同舟云学术

Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model

Published:2017-04-25 Issue:9 Volume:25 Page:10312
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Liu Zhaowu,Jiang Shan,Li Xiaotian,Song Ying,Li Wenhao,Bayanheshig

Funder

Jilin Province Science & Technology Development Program Project in China

Ministry of National Science and Technology for the National Key Basic Research Program of China

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference20 articles.

1. Reducing the line curvature error of mechanically ruled gratings by interferometric control

2. Holographic fabrication of large-constant concave gratings for wide-range flat-field spectrometers with the addition of a concave lens

3. Hybrid 2D–3D optical devices for integrated optics by direct laser writing

4. Dimensional metrology for nanometre-scale science and engineering: towards sub-nanometre accurate encoders

5. Doppler writing and linewidth control for scanning beam interference lithography

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