Sub-70 nm resolution tabletop microscopy at 138 nm using a compact laser–plasma EUV source-Reference-Cited by-同舟云学术

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Sub-70 nm resolution tabletop microscopy at 138 nm using a compact laser–plasma EUV source

Published:2010-07-02 Issue:14 Volume:35 Page:2337
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Wachulak Przemyslaw W.,Bartnik Andrzej,Fiedorowicz Henryk

Funder

Foundation for Polish Science

European Commission

European Economic Area (EEA)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference9 articles.

1. EUV pattern defect detection sensitivity based on aerial image linewidth measurements

2. Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

3. Nanoimaging with a compact extreme-ultraviolet laser

4. Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light

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