Large area structural color printing based on dot-matrix laser interference patterning

Abstract

Optically Variable Devices (OVDs) are widely used as security features in anti-counterfeiting efforts. OVDs enable the display of color dynamic effects that are easily interpreted by the user. However, obtaining these elements over large areas poses certain challenges in terms of efficiency. The paper presents a modified approach for manufacturing plasmonic type OVDs through dot-matrix technology, which is a standard origination step of security holograms. By adjusting the spatial filters in the optical scheme, it is possible to double the resolution of the recorded quasi-sinusoidal diffraction gratings. The experiments confirm the creation of diffraction gratings with frequencies from 1600 to 3500 lines per mm, which facilitates the production of plasmonic zero-order spectral filters. The paper shows how the transmission characteristics of the studied elements are affected by the geometric parameters of the diffraction grating, silver layer thickness, angle of incidence, and polarization of light. The results have shown that using the proposed method it is possible to obtain 1D or 2D structural color OVD-image on a large area - several square centimeters and more. High speed recording of such elements is provided: the exposure time was from 120 to 400 ms depending on the grating resolution for a 0.05 mm2 frame, the total printing time for the size of the 25×25 mm2 OVD was about 2.5 hours for a 1D element, and less than 3.5 hours for a 2D element. Thus, the proposed method and the OVD elements produced by it can be useful to designers of optical security elements as a simpler and faster alternative to electron-beam lithographic technologies.