Impacts of p-GaN layer thickness on the photoelectric and thermal performance of AlGaN-based deep-UV LEDs

Author:

Li Saijun,Shen Meng-Chun,Lai Shouqiang,Dai Yurong,Chen Jinlan,Zheng Lijie,Zhu Lihong,Chen Guolong,Lin Su-Hui,Peng Kang-Wei,Chen Zhong1,Wu Tingzhu1ORCID

Affiliation:

1. Xiamen University

Abstract

The effects of different p-GaN layer thickness on the photoelectric and thermal properties of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were investigated. The results revealed that appropriate thinning of the p-GaN layer enhances the photoelectric performance and thermal stability of DUV-LEDs, reducing current crowding effects that affect the external quantum efficiency and chip heat dissipation. The ABC + f(n) model was used to analyse the EQE, which helped in identifying the different physical mechanisms for DUV-LEDs with different p-GaN layer thickness. Moreover, the finite difference time domain simulation results revealed that the light-extraction efficiency of the DUV-LEDs exhibits a trend similar to that of damped vibration as the thickness of the p-GaN layer increases. The AlGaN-based DUV-LED with a p-GaN layer thickness of 20 nm exhibited the best photoelectric characteristics and thermal stability.

Funder

Compound semiconductor technology Collaborative Innovation Platform project of FuXiaQuan National Independent Innovation Demonstration Zone

Fujian Province Central Guidance Local Science and Technology Development Fund Project In 2022

Science and Technology Plan Project in Fujian Province of China

Natural Science Foundation of Fujian Province

National Natural Science Foundation of China

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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