Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography-Reference-Cited by-同舟云学术

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Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Published:2015-06-16 Issue:13 Volume:23 Page:16628
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Bourgin Yannick,Siefke Thomas,Käsebier Thomas,Genevée Pascal,Szeghalmi Adriana,Kley Ernst-Bernhard,Zeitner Uwe D.

Funder

Bundesministerium für Forschung und Technologie (German Ministry for Research and Technology)

Deutsche Forschungsgemeinschaft (DFG)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference18 articles.

1. Compression of amplified chirped optical pulses

2. Fabrication of 200nm period blazed transmission gratings on silicon-on-insulator wafers

3. Antireflective submicrometer gratings on thin-film silicon solar cells for light-absorption enhancement

4. Color filter based on a two-dimensional submicrometer metal grating

5. Large flexible nanowire grid visible polarizer made by nanoimprint lithography

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1. Exploring the processing capability of femtosecond laser two-photon polymerization pathway;3rd International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2023);2023-08-17

2. Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyond;Optics Express;2018-07-18

3. Polarization Control by Deep Ultra Violet Wire Grid Polarizers;Optical Characterization of Thin Solid Films;2018

4. 175 nm period grating fabricated by i-line proximity mask-aligner lithography;Optics Letters;2017-09-21

5. Simulation of the influence of line edge roughness on the performance of deep ultraviolet wire grid polarizers;SPIE Proceedings;2017-06-26

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