Infrared dielectric properties of low-stress silicon oxide-Reference-Cited by-同舟云学术

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Infrared dielectric properties of low-stress silicon oxide

Published:2016-03-17 Issue:7 Volume:41 Page:1364
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Cataldo Giuseppe,Wollack Edward J.,Brown Ari D.,Miller Kevin H.

Funder

National Aeronautics and Space Administration (NASA)

Goddard Space Flight Center (GSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference29 articles.

1. Optical constants of silica glass from extreme ultraviolet to far infrared at near room temperature

2. Miscellaneous data on materials for millimetre and submillimetre optics

3. The structure of evaporated silicon oxide films and its effect on the electrical and optical properties

4. Temperature and frequency dependences of the far-infrared and microwave optical absorption in amorphous materials

5. Fabrication of Compact Superconducting Lowpass Filters for Ultrasensitive Detectors

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