Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference23 articles.
1. Growth of laser-initiated damage in fused silica at 351 nm
2. Growth of laser damage in SiO 2 under multiple wavelength irradiation
3. Parametric study of the growth of damage sites on the rear surface of fused silica windows
4. Growth of laser damage in fused silica: diameter to depth ratio
5. Self-focusing and rear surface damage in a fused silica window at 1064 nm and 355 nm
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1. Photoluminescence probing of light absorption centers at silica laser damage;Optics Express;2024-07-09
2. Characteristics of shock wave in 355 nm laser-induced damage growth in fused silica;Journal of Physics D: Applied Physics;2024-04-17
3. 1064 nm纳秒激光辐照下HfO2/SiO2增透膜损伤的动态过程研究;Chinese Journal of Lasers;2024
4. Behavior of 355 nm laser-induced damage growth in fused silica;Optics & Laser Technology;2023-02
5. Atomic simulation of surface damage of fused silica under laser irradiation;Acta Physica Sinica;2023
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