Plasmonic nanoresonator distributions for uniform energy deposition in active targets

Author:

Vass Dávid1,Szenes András1,Tóth Emese1,Bánhelyi Balázs12,Papp István13,Bíró Tamás1,Csernai László P.134,Kroó Norbert15,Csete Mária1

Affiliation:

1. Wigner Research Centre for Physics

2. University of Szeged, Department of Computational Optimization

3. University of Bergen, Department of Physics and Technology

4. Frankfurt Institute for Advanced Studies

5. Hungarian Academy of Sciences

Abstract

Active targets implanted with core-shell-composition (CS) and nanorod-shaped (NR) plasmonic nanoresonators and doped with dyes were designed to ensure uniform energy deposition during illumination by two-counter propagating short laser pulses. The near-field enhancement, optical responses, and cross-sections were mapped above the concentration-Epump parameter-plane to inspect two different regions (I and II) with the potential to improve light-matter interaction phenomena. The distribution of steady-state absorption, as well as of the power-loss and power-loss density integrated until the complete overlap of the two short pulses was determined. The uniform distribution was adjusted to constrain standard deviations of the integrated power-loss distributions in the order of ∼10%. Dye doping of target-I/II implanted with uniform CS (NR) nanoresonator distributions results in larger absorption with increased standard deviation, larger power-loss, and power-loss density with decreased (decreased / increased) standard deviation. The adjustment allows larger absorption in CS-II and larger power-loss and power-loss density in CS-implanted targets, smaller standard deviation in targets-I for absorption, and in all targets for power-loss and its density. Larger dye concentration makes it possible to achieve larger absorption (except in adjusted NR-II), larger power-loss and power-loss density in all CS and in adjusted NR distributions, with decreased standard deviation in CS-implanted targets for all quantities and in NR-implanted targets for absorption. CS implantation results in larger absorption with a larger standard deviation, moreover allows larger power-loss in adjusted distributions and smaller standard deviation in power-loss quantities for larger concentration in both distributions and the same standard deviation for smaller concentration in adjusted distribution. Based on these results, adjusted CS distributions in targets doped with a dye of higher concentration are proposed.

Funder

Norges Forskningsråd

Eötvös Lóránd Research Network of Hungary

Nemzeti Kutatási Fejlesztési és Innovációs Hivatal

Publisher

Optica Publishing Group

Subject

Electronic, Optical and Magnetic Materials

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