Author:
Murakami Katsuhiko,Oshino Tetsuya,Shimizu Sumito,Wasa Wakana,Kondo Hiroyuki,Ohtani Masayuki,Kandaka Noriaki,Mashima Kiyoto,Nomura Kazushi
Abstract
Research activities on the development of basic technologies for EUVL at Nikon, which include debris elimination of a laser plasma x-ray source, 3-mirror ring-field projection optics design, ring-field Köhler-critical illumination system design, asphere fabrication by partially corrective polishing, and electroplated reflection masks, are described.