Abstract
Surface imaging technology has the potential of providing enhanced
resolution, larger process latitude and extending the capabilities of
optical lithography tools. Surface imaging resist (SIR) processing in
the form of the DESIRE process has been used at Texas Instruments for
some time. Originally developed for g-line exposure tools (436 nm), it
is now being used to push the capabilities of a 248 nm DUV stepper. In
this paper the advantages of SIR are reviewed, the current practices
described, and prospects for the future applications discussed.