Characterization of SAL605 Negative Resist at λ=13 nm

Abstract

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet (λ=13nm). The sensitivity was found to be ~1 mJ/cm2 for all conditions studied. We have identified processing conditions leading to high (γ>4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.