Research on the removal characteristics of surface error with different spatial frequency based on shear thickening polishing method

Author:

Wang Yusheng1,Hu Jie1,Dai Yifan1,Hu Hao1,Wang Yu1,Peng Wenxiang1,Du Chunyang1ORCID

Affiliation:

1. Hu’nan Key Laboratory of Ultra-Precision Machining Technology

Abstract

X-ray mirrors, which are essential for constructing synchrotron radiation light sources, are highly required for full-range spatial wavelength errors. This paper investigated power-law non-Newtonian fluids and pointed out that both three-body removal and shear removal existed in the shear thickening polishing process. Subsequently, this paper calculates the shear force of the power-law non-Newtonian fluid polishing fluid in polishing the surface with different frequency errors. It establishes an MRR model of shear thickening polishing in the frequency domain by combining it with the Archard equation. Then, this model is also applied to optimize the polishing fluid formulation and processing parameters. Finally, the removal effect of the optimized polishing fluid on the mid-frequency ripple error is experimentally verified. On Ф50 mm monocrystalline silicon, the removal of mid-frequency ripple error with a spatial wavelength of 1 mm was achieved by shear thickening polishing technique while converging the surface roughness to 0.14 nm. Finally, the experimental results were applied to monocrystalline silicon with a length of 500 mm. This work provides a new research idea for the existing shear thickening polishing process. It provides theoretical and technical support for removing the mid- and high-frequency errors in high-precision X-ray mirrors.

Funder

National Natural Science Foundation of China

Publisher

Optica Publishing Group

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