Author:
Kawata Hiroshi,Nakamura Norio,Kato Ryukou,Sakai Hiroshi,Tsuchiya Kimichika,Tanimoto Yasunori,Honda Yosuke,Shimada Miho,Tanikawa Takanori,Tanaka Olga A.,Obina Takashi,Michizono Shinichiro
Abstract
The development of a high-power EUV light source is important to overcome the stochastic effects in future lithography. The EUV-FEL light source is one of the promising candidates. This paper proposes the accelerator development plan.