Abstract
DC magnetron sputtering is the dominant deposition process for the high volume production of ITO (Indium-Tin-Oxide) thin films. Most of the applications require low resistivity and highly transparent layers. Depending on the process conditions the deposited ITO is either amorphous or crystalline. The major parameters, which influence the structure and the film performance, will be discussed. The emphasis is on conditions, which allow optimizing the optical as well as the electronic performance.