Preliminary Survey of Material Pairs for XUV Multilayer Mirrors for Wavelengths Below 130 Å

Author:

Montcalm Claude,Kearneyt P. A.,Slaughtert J. M.,Chaker M.,Falco Charles M.

Abstract

Remarkable progress, within limited wavelength ranges, has been made in the field of normal incidence XUV mirrors. High performance Mo/Si multilayer mirrors exist for wavelengths between 125 and ~250 Å, and reflectivities greater than 60% have been achieved around 130-140 Å.1-4 Good results were also obtained with C and B4C-based multilayer mirrors at wavelengths just above the C and the B K-absorption edges at 44 Å and 67 Å, respectively.5-7 However, there are wavelength regions such as the water window or just below the Si L-edge, where none of the well-established material pairs can achieve reflectivities adequate for many applications. The search for new material pairs to bridge these wavelength gaps has motivated the work that is briefly discussed here.

Publisher

Optica Publishing Group

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