Author:
Hoffbauer M.A.,Cross J.B.,Farr J.D.,Bermudez V.M.
Abstract
The inherent theoretical advantages of GaAs electronic devices over those employing Si technology are severely limited in practice by the difficulty of forming passivating oxide layers. 1 Problems encountered with oxide stoichiometry, crystallinity, interface defects, and chemical stability have been the subjects of numerous studies over the last 15 years. 2-8 One of the major factors contributing to these problems is the differing rates of oxidation of Ga and As and the volatility of the AS2O3 and AS2O5 products at temperatures above ~100 °C.