Tunable two-mirror interference lithography system for wafer-scale nanopatterning-Reference-Cited by-同舟云学术

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Tunable two-mirror interference lithography system for wafer-scale nanopatterning

Published:2011-08-11 Issue:16 Volume:36 Page:3176
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Mao Weidong,Wathuthanthri Ishan,Choi Chang-Hwan

Funder

Defense Advanced Research Projects Agency (DARPA)

American Chemical Society Petroleum Research Fund (PRF)

National Science Foundation (NSF)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference18 articles.

1. Fabrication of photonic crystals for the visible spectrum by holographic lithography

2. Low cost nanolithography with nanoaccuracy

3. Crystallography of two-dimensional photonic lattices formed by holography of three noncoplanar beams

4. Controllable fabrication of two-dimensional compound photonic crystals by single-exposure holographic lithography

5. Large-Area Two-Dimensional Mesoscale Quasi-Crystals

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