Photosensitive processes in silica glass using 193 nm light

Author:

Albert Jacques

Abstract

The name "Photosensitivity" is associated with the process by which the refractive index of certain types of silica glasses is permanently modified by exposure to short wavelength optical radiation [1]. The process was discovered in germano-silicate optical fibers exposed to intense blue light (λ=488 nm) from an Argon ion laser [2] but further experiments revealed that the photoinduced index change grows as the square of the laser intensity, indicating a two-photon process[3]. It was eventually found that the photosensitivity was due to an absorption band with a maximum near 242 nm [4], similar to the absorption observed in oxygen deficient germania (i.e. GeO sites in GeO2 )[5]. With direct excitation from intense UV light in the absorption band, the refractive index change in standard optical fibers reaches 10-4 and the process becomes sufficiently efficient for writing Bragg gratings in fibers by side exposure [4],[6]. These advances have led to the developement of several important applications [7]. Finally, apart from using special fibers with enhanced photosensitivity (from higher germanium concentration, co-dopants, or processing in reducing atmospheres), two methods have been proposed to increase the photosensitivity of standard fibers: flame brushing [8] and low temperature hydrogen (H2) loading [9]. With these techniques, refractive index changes in the 10-3 -10-2 range have been reached, extending the variety of useful fiber devices and allowing other applications to become practical [10-12].

Publisher

Optica Publishing Group

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