Nanoscale plasmonic logic gates design by using an elliptical resonator

Abstract

This study implemented AND, NAND, OR, XOR, NOR, XNOR, and NOT plasmonic logic gates using the finite element method. The all-optical nanoscale logic gates were designed using a single structure based on the technology of insulator-metal-insulator nanoscale plasmonic waveguides. The phase of optical waves and the position of the control and input ports are the most important factors for attaining the optimal transmission value based on interference between the input and control ports. The transmission threshold is 35%, and 850 nm is the operating wavelength. This design creates nanoscale logic gates with a structure dimension of 250nm×250nm. The transmission threshold, modulation depth, contrast ratio, and insertion loss criteria were proposed to evaluate the efficacy of the all-optical gates.