Modeling the photochemical kinetics induced by holographic exposures in PQ/PMMA photopolymer material-Reference-Cited by-同舟云学术

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Modeling the photochemical kinetics induced by holographic exposures in PQ/PMMA photopolymer material

Published:2011-10-31 Issue:11 Volume:28 Page:2833
ISSN:0740-3224
Container-title:Journal of the Optical Society of America B
language:en
Short-container-title:J. Opt. Soc. Am. B

Author:

Liu Shui,Gleeson Michael R.,Guo Jinxin,Sheridan John T.,Tolstik Elen,Matusevich Vladislav,Kowarschik Richard

Funder

Enterprise Ireland

Science Foundation Ireland, the Irish Research Council for Science, Engineering and Technology

Graduierten-Akademie

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Statistical and Nonlinear Physics

Reference38 articles.

1. Photopolymer holographic recording material

2. Nonlocal photopolymerization kinetics including multiple termination mechanisms and dark reactions Part I Modeling

3. Nonlocal photopolymerization kinetics including multiple termination mechanisms and dark reactions Part II Experimental validation

4. Non-local photo-polymerization kinetics including multiple termination mechanisms and dark reactions: Part III Primary radical generation and inhibition

5. Photoinitiation study of Irgacure 784 in an epoxy resin photopolymer

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1. Holographic Properties of Irgacure 784/PMMA Photopolymer Doped with SiO2 Nanoparticles;Polymers;2023-11-13

2. 多维调制全息数据存储研究进展;Acta Optica Sinica;2023

3. Phenanthraquinone-Doped Polymethyl Methacrylate Photopolymer for Holographic Recording;Molecules;2022-09-23

4. Study on PQ/PMMA Photopolymer Films Fabricated by Solvent Casting;ACS Omega;2022-03-28

5. Preparation of poly(eugenol-co-methyl methacrylate)/polypropylene blend by creative route approach: structural and thermal characterization;Iranian Polymer Journal;2021-07-22

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