Self-consistent optical constants of SiO_2 and Ta_2O_5 films-Reference-Cited by-同舟云学术

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Self-consistent optical constants of SiO_2 and Ta_2O_5 films

Published:2016-10-26 Issue:11 Volume:6 Page:3622
ISSN:2159-3930
Container-title:Optical Materials Express
language:en
Short-container-title:Opt. Mater. Express

Author:

Rodríguez-de Marcos Luis V.,Larruquert Juan I.,Méndez José A.,Aznárez José A.

Funder

Secretaría de Estado de Investigación, Desarrollo e Innovación (SEIDI)

Publisher

The Optical Society

Subject

Electronic, Optical and Magnetic Materials

Reference53 articles.

1. Storage ring free-electron lasing at 176 nm--dielectric mirror development for vacuum ultraviolet free-electron lasers

2. The Marshall Space Flight Center solar ultraviolet magnetograph

3. Polarizing and non-polarizing mirrors for the hydrogen Lyman-α radiation at 121.6 nm

4. Vacuum ultraviolet thin films 1: Optical constants of BaF_2, CaF_2, LaF_3, MgF_2, Al_2O_3, HfO_2, and SiO_2 thin films

5. A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

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