Author:
Ye Hanqiao,Xiong Yifan,Zuo Rubing,Morita Masaya,Kaichi Kenta,Maruta Akihiro,Kajii Hirotake,Morifuji Masato,Kondow Masahiko
Abstract
We improved dry etching process by introducing 3-steps etching and 3 layers of quantum dots for fabricating the CirD laser that will be used for intra-chip optical communications. Excellent lasing property was consequently obtained.