Analysis of a phase-modulating recording mechanism in negative photoresist
Author:
Publisher
The Optical Society
Subject
General Engineering
Reference23 articles.
1. Spectral Sensitivity and Linearity of Shipley AZ-1350J Photoresist
2. Photodielectric polymer for holographic recording
3. Volume Hologram Formation in Photopolymer Materials
4. Multicomponent photopolymer systems for volume phase holograms and grating devices
5. Photopolymer Material for Holography
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2. Holographic technique for measurement of the kinetic constant and optical modulation of photosensitive materials;Applied Optics;2010-06-14
3. Area-Modulated Recordings For One-Dimensional Optical Signal Processors;Optical Engineering;1988-06-01
4. Self-diffraction for intrinsic optical modulation evolution measurement in photoresists;Applied Optics;1988-05-15
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