Investigation of stress induced by CO2 laser processing of fused silica optics for laser damage growth mitigation
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference21 articles.
1. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm
2. Investigation of processes leading to damage growth in optical materials for large-aperture lasers
3. Localized CO 2 -laser treatment for mitigation of 351-nm damage growth in fused silica
4. Enhanced performance of large 3ω optics using UV and IR lasers
5. Mechanisms of CO 2 laser mitigation of laser damage growth in fused silica
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1. Microsecond-pulsed CO2 laser cleaning of high damage threshold fused silica;International Journal of Mechanical Sciences;2024-10
2. Material migration and damage characteristics of fused silica optical surface treated by CO2 laser/short – pulse ultraviolet laser;Optics & Laser Technology;2024-08
3. Rapid and high throughput formation of through glass vias;Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIX;2024-03-12
4. Effects of annealing on thermal stress generation during the cooling process of large-size silica glass;Journal of Non-Crystalline Solids;2024-03
5. Ultrafast Process Characterization of Laser-Induced Damage in Fused Silica Using Pump-Probe Shadow Imaging Techniques;Materials;2024-02-09
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