Abstract
An approach for measuring the surface profile of the samples with
reflection variations using the Nomarski differential interference
method is presented. The system is analyzed with Jones’s matrices
tool, and polarization effects of a non-polarizing beam splitter are
taken into account. Equations are also developed to allow the
determination of the surface profile from interference intensity when
the sample reflectively is not uniform. The validity and accuracy of
the measurement are verified by measuring the adhered silicon
cantilever on a substrate with high reflectivity. This
method is expected to be a valuable tool to inspect elements of
micromechanics and microsystems.
Funder
Ministry of Science and Higher Education
of Russia for Valiev Institute of Physics and Technology of
RAS
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering