Dual-pulse bispectral laser excitation and plasma initiation in an extreme-UV radiation source for nanolithography
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Published:2017-11-01
Issue:11
Volume:84
Page:753
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ISSN:1070-9762
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Container-title:Journal of Optical Technology
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language:en
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Short-container-title:J. Opt. Technol.
Author:
Seĭsyan R. P.,Bespalov V. G.,Zhevlakov A. P.,Makarov E. A.,Rodionov A. Yu.
Publisher
The Optical Society
Subject
Applied Mathematics,Computational Mathematics,General Engineering,Atomic and Molecular Physics, and Optics