Simulation, optimization, and characterization of AR surfaces for use with unique high-throughput fabrication techniques

Author:

Winters Alexander1,Furst Stephen,Cates Nichole,Micklow Lauren,Mirotznik Mark1

Affiliation:

1. University of Delaware

Abstract

Optical anti-reflective (AR) surfaces are capable of improving performance of solar cells, HUD displays, and other important optical applications. However, fabricating these surfaces in a cost-effective way for large-area product applications has continued to be a challenge. In this paper we use rigorous coupled-wave (RCW) simulation to determine the effects fabrication constraints have on the performance of a sub-wavelength, anti-reflective pattern created with a new, highly scalable process. The goal is to use simulation results to drive meaningful improvements to the fabrication process, thereby broadening the applicability of AR surfaces. A number of possible AR surface geometries are simulated and analyzed, emphasizing the optimal geometries for low aspect ratios. The main parameters that dictate the efficiency and fabricability of AR surfaces are reviewed. Finally, we experimentally characterize a sample AR surface to validate the model and find the benefits and limitations of the new scalable fabrication process. RCW simulation indicates that the parabolic AR surface model is the best choice for our fabrication process, due to superior wide-angle reflectance reduction and ease of fabrication. Further analysis demonstrates that AR surfaces with higher fill factors and higher aspect ratios show noticeably lower reflectance. Experimental validation of a sample AR surface showed good conformity to simulation results, opening the door for further development of novel fabrication processes.

Funder

U.S. Army Combat Capabilities Development Command

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Statistical and Nonlinear Physics

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3