Laser-induced carbon CVD on a moving fused quartz substrate: morphological and oscillatory deposition characteristics-Reference-Cited by-同舟云学术

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Laser-induced carbon CVD on a moving fused quartz substrate: morphological and oscillatory deposition characteristics

Published:2003 Issue:12 Volume:41 Page:2307-2316
ISSN:0008-6223
Container-title:Carbon
language:en
Short-container-title:Carbon

Author:

Kwok King Hong,Chiu Wilson K.S.

Publisher

Elsevier BV

Subject

General Chemistry,General Materials Science

Reference37 articles.

1. Carbon growth by thermal laser-assisted chemical vapor deposition;Westberg;Thin Sol. Films,1992

2. Laser processing of thin films and microstructures;Boyd,1987

3. Deposition rate and temperature of carbon films during laser-induced CVD on a moving substrate;Kwok;Carbon,2003

4. Low speed deposition process for hermetic optical fibers;Lindholm,1999

5. Application of diamond-like carbon films as hermetic coatings on optical fibers;Dowling;Diamond Relat. Mat.,1996

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Variation in the Etch Rate of LIBWE Fabricating Deep Microtrenches;Journal of Laser Micro/Nanoengineering;2012-02

2. Laser-Based Growth of Nanostructured Thin Films;Nanostructured Materials and Their Applications;2011-10-22

3. Growth kinetics and microstructure of carbon deposited on quartz plates and optical fibers by open-air laser-induced chemical vapor deposition;Thin Solid Films;2005-12

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