Analysis of the properties of functional titanium dioxide thin films deposited by pulsed DC magnetron sputtering with various O 2 :Ar ratios-Reference-Cited by-同舟云学术

Analysis of the properties of functional titanium dioxide thin films deposited by pulsed DC magnetron sputtering with various O 2 :Ar ratios

Published:2017-07 Issue: Volume:69 Page:96-104
ISSN:0925-3467
Container-title:Optical Materials
language:en
Short-container-title:Optical Materials

Author:

Mazur Michal

Funder

Ministry of Science and Higher Education

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Spectroscopy

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