Influence of nitrogen partial pressure on morphology, structure and transport properties of reactive sputtered polycrystalline TiN films
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference20 articles.
1. The electronic structure of TiN and VN: X-ray and electron spectra compared to band structure calculations
2. Tissue-biomaterial interactions
3. Titanium alloys in total joint replacement—a materials science perspective
4. A review of the present state of art in hard coatings grown from the vapor phase
5. Color of titanium nitride prepared by reactive dc magnetron sputtering
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1. Preparation and properties of a super-hydrophobic, electromagnetic interference shielding titanium nitride film;Thin Solid Films;2023-10
2. The anti-sand erosion performance of TiN films fabricated by filtered cathodic vacuum arc technique at different nitrogen flow rates;Ceramics International;2019-06
3. Influence of Annealing Temperature on the Microstructure and Morphology of TiN Films Synthesized by Dual Magnetron Sputtering;Technical Physics;2018-08
4. Improved irradiation tolerance of reactive gas pulse sputtered TiN coatings with a hybrid architecture of multilayered and compositionally graded structures;Journal of Nuclear Materials;2018-04
5. Study on the electromagnetic interference shielding effectiveness of TiN film;Journal of Materials Science: Materials in Electronics;2018-03-21
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