Towards a multiscale approach to the growth of silicon films by chemical vapor deposition-Reference-Cited by-同舟云学术

Towards a multiscale approach to the growth of silicon films by chemical vapor deposition

Published:2000-10 Issue:2-3 Volume:66 Page:229-235
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Masi Maurizio,Bertani Valeria,Cavallotti Carlo,Carrà Sergio

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference34 articles.

1. K.F. Jensen, in: M.L. Hitchmann, K.F. Jensen (Eds.), Chemical Vapor Deposition: Principles and Applications, Academic Press, New York, 1993.

2. Kinetic approach to materials synthesis by gas-phase deposition

3. A.A. Chernov, Modern Crystallography: III. Crystal Growth, Springer Series Solid State, Vol. 36, Springer, Berlin, 1994.

4. Step Kinetics by One-Dimensional 'Nucleation'

5. A. Pimpinelli, P. Jensen, H. Larralde, P. Peyla, in: Morphological Organization During Epitaxial Growth and Removal, World Scientific Series of Condensed Matter Physics, World Scientific, Singapore, 1997.

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