Ultrafast microscopy of laser ablation of refractory materials: ultra low threshold stress-induced ablation-Reference-Cited by-同舟云学术

Ultrafast microscopy of laser ablation of refractory materials: ultra low threshold stress-induced ablation

Published:2001-12 Issue:3 Volume:145 Page:183-194
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Koulikov Serguei G.,Dlott Dana D.

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference28 articles.

1. Ultrafast imaging of optical damage dynamics and laser‐produced wave propagation in polymethyl methacrylate

2. S.G. Koulikov, D.D. Dlott, in: Advances in Non-impact Printing Technologies, Vol. 14, Society for Imaging Science and Technology, Springfield, VA, 1998, p. 172.

3. Ablation of polymethyl methacrylate films by pulsed (ns) ultraviolet and infrared (9.17 μm) lasers: A comparative study by ultrafast imaging

4. Ultrafast imaging of 0.532‐μm laser ablation of polymers: Time evolution of surface damage and blast wave generation

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