AFM nanoindentation-based mechanical investigation of 3D confinement effects on nanoarchitectonic arrays of Ag nanodisks-Reference-Cited by-同舟云学术

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AFM nanoindentation-based mechanical investigation of 3D confinement effects on nanoarchitectonic arrays of Ag nanodisks

Published:2022-04 Issue: Volume:163 Page:110605
ISSN:0022-3697
Container-title:Journal of Physics and Chemistry of Solids
language:en
Short-container-title:Journal of Physics and Chemistry of Solids

Author:

Roa Simón^ORCID,Sirena Martín,Redondo Carolina,Morales Rafael

Funder

H2020 Marie Skłodowska-Curie Actions

Comisión Nacional de Energía Atómica, Gobierno de Argentina

Consejo Nacional de Investigaciones Científicas y Técnicas

Euskal Herriko Unibertsitatea

Universidad Nacional de Cuyo

Horizon 2020

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference89 articles.

1. A mini-review on the development of Si-based thin film anodes for Li-ion batteries

2. Spectral selective and photothermal nano structured thin films for energy efficient windows

3. Nanoarchitectonics for Dynamic Functional Materials from Atomic-/Molecular-Level Manipulation to Macroscopic Action

4. Templated Synthesis for Nanoarchitectured Porous Materials

5. Nanocomposite Multilayer Binary Nitride Coatings Based on Transition and Refractory Metals: Structure and Properties

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1. Atomistic insight of deformation mechanisms and mechanical characteristics of nano-scale silver (100) using nanoindentation;Materials Today Communications;2024-08

2. Au nanodisks-based 2D photonic crystals fabricated by single-beam laser interference lithography: A simple and reliable alternative for highly efficient large-scale SERS molecular sensors;Materials Today Chemistry;2024-06

3. Characterization techniques;Nanochemistry;2024

4. Analytical solution for size-dependent nonlinear behavior of AFM microcantilever with assembled probe in liquid environments;Mechanics of Advanced Materials and Structures;2023-10-06

5. Annealing effects on photoresist films' mechanical and chemical resistance;Surfaces and Interfaces;2023-10

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