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Shrinkage and expansion of discharge areas in plasma discharge devices having complex oxide protective layers

  • Published:2019-07 Issue: Volume:130 Page:172-179
  • ISSN:0022-3697
  • Container-title:Journal of Physics and Chemistry of Solids
  • language:en
  • Short-container-title:Journal of Physics and Chemistry of Solids

Author:

Takeda Eiji,Zukawa Takehiro,Ishibashi Tasuku,Yoshino Kyohei,Kosugi Naoki,Morita Yukihiro,Fujii MinoruORCID

Funder

AVC Devices Development Center, Technology Planning and Development Center, AVC Networks Company of the Panasonic Corporation

Image Devices Development Center, Corporate R&D Division of the Panasonic Corporation

Production Engineering Laboratory, Manufacturing Technology and Engineering Division of the Panasonic Corporation

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

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