Oxygen adsorption-desorption effect on the electrical properties of a-Si:H layers

Author:

Aoucher M.,Mohammed-Brahim T.,Bodin C.,Mencaraglia D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Si(111) surface oxidation: O1s core-level study using synchrotron radiation;Hollinger;Surf. Sci.,1986

2. Oxygen adsorption on Si(111) in different modifications: 7 × 7, 1-1, Ni and sputtered;Morgan;Surf. Sci.,1985

3. Metastable molecular precursor for the dissociative adsorption of oxygen on Si(111);Hofer;Phys. Rev. Lett.,1985

4. Adsorption of molecular oxygen on Si(111);Hofer;Surf. Sci.,1989

5. Desorption energy of oxygen adsorbed on unintentionally doped low pressure chemical vapor deposited silicon films;Mostefa;Proc. Polycrystalline Semiconductors III Conf., Saint-Malo, France,1993

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