Author:
Knoll M.,Cammann K.,Dumschat C.,Sundermeier C.,Eshold J.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. M. Knoll, Deutsches Patent No. DE 41 15414 A1.
2. M. Knoll, K. Cammann, C. Dumschat, J. Eschold and C. Sundermeier, Micromachined ion-selective electrodes with polymer matrix membranes, Sensors and Actuators, accepted for publication.
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4. New suspended gate FET technologies for physical deposition of chemically sensitive layers;Lorenz;Sensors and Actuators,1990
5. Photolithographically patternable nitrate-sensitive acrylate-based membrane;Dumschat;Anal. Chim. Acta,1991
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