Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor-Reference-Cited by-同舟云学术

Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

Published:2004-06 Issue:1-2 Volume:374 Page:362-368
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Dasgupta Arup,Kuppusami P.,Lawrence Falix,Raghunathan V.S.,Antony Premkumar P.,Nagaraja K.S.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference37 articles.

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5. V.N. Khominich, US Patent No. 6103074 (2000).

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