A deterministic mechanic model for predicting the strain energy across the wafer bonding process coupling the effects of normal pressure and wafer geometry

Author:

Jiang Jiahao,Sun YunyunORCID

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Applied Mathematics,Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science,Modeling and Simulation

Reference28 articles.

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3. Process parameters influence on mechanical strength of direct bonded surfaces for both materials: silica and Zerodur® glasses[J];Cocheteau;Journal of Adhesion Science and Technology,2014

4. Mechanism of indium tin oxide//indium tin oxide direct wafer bonding[J];Hönle;Thin Solid Films,2020

5. Plasma-activated direct bonding at room temperature to achieve the integration of single-crystalline GaAs and Si substrate[J];Huang;Results in Physics,2021

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