Existence and thermal stability of mono and dihydride phases on Si(1 1 1) and Ge(1 1 1) surfaces
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference16 articles.
1. Mono- and dihydride phases on silicon surfaces — a comparative study by EELS and UPS
2. Reversible process of hydrogen adsorption on Si(111)
3. Broken-dimer model ina-Si:H
4. Chemisorption of atomic hydrogen on the silicon (111) 7 × 7 surface
5. Surface Electronic Structure of Si (111)-(7×7) Resolved in Real Space
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1. The influence of lattice oxygen on the initial growth behavior of heteroepitaxial Ge layers on single crystalline PrO2(111)∕Si(111) support systems;Journal of Applied Physics;2008-04-15
2. Hydrogen interaction with clean and modified silicon surfaces;Surface Science Reports;1999-10
3. Chlorine extraction by atomic hydrogen on Si(111)-7×7 surfaces;Surface Science;1999-08
4. Adsorption and decomposition of H2S on the Ge(100) surface;Applied Surface Science;1999-08
5. Surface reactions of monoethylgermane on Si(100)-(2×1);Surface Science;1998-03
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