Dielectric data, densities, refractive indices, and their deviations of the binary mixtures of N-methyldiethanolamine with sulfolane at temperatures 293.15–328.15K and atmospheric pressure
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,Condensed Matter Physics,Instrumentation
Reference27 articles.
1. Selective absorption of hydrogen sulfide from gas streams;Frazier;Ind. Eng. Chem.,1950
2. Solubility of carbon dioxide in aqueous mixtures of N-methyldiethanolamine+piperazine+sulfolane;Hosseini-Jenab;J. Chem. Eng. Data,2005
3. Partial molar volumes of C2–C5 normal and branched nitriles in sulfolane solutions at 30°C,;Janneli;J. Chem. Eng. Data,1984
4. Organic Solvents;Riddick,1981
5. Excess volumes viscosity of water–sulfolane mixtures at 30, 40, and 50°C;Sacco;Thermochim. Acta,1981
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