Effects of Ar and O2 additives on photopatternable sol–gel etching in an SF6-based plasma for planar lightwave circuit fabrication-Reference-Cited by-同舟云学术

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Effects of Ar and O2 additives on photopatternable sol–gel etching in an SF6-based plasma for planar lightwave circuit fabrication

Published:2010-11 Issue:11 Volume:87 Page:2071-2076
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kolodziejczyk B.,Ellingboe A.R.,Daniels S.,Oksuz L.,Oubaha M.,Barry H.,Copperwhite R.,O’Dwyer K.,MacCraith B.D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Photo-patternable optical chemical sensors based on hybrid sol–gel materials

2. Sol-gel coatings for optical chemical sensors and biosensors

3. K.R. Kribich, H. Barry, R. Copperwhite, B. Kolodziejczyk, K. O’Dwyer, J.M. Sabattié, B.D. MacCraith, in: Giancarlo C. Righini, Seppo Honkanen (Eds.), Proc. SPIE, Integrated Optics and Photonic Integrated Circuits, vol. 5451, 2004, pp. 518–528.

4. K.R. Kribich, R. Copperwhite, H. Barry, B. Kolodziejczyk, J.M. Sabattié, K. O’Dwyer, B.D. MacCraith, Novel Chemical Sensor/Biosensor Platform Based on Optical Multimode Interference (MMI) Coupler.

5. New organic inorganic sol–gel material with high transparency at 1.55μm

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