Precision micro-/nano-machining in a scanning electron microscope by run-to-run control based on image feedbacks-Reference-Cited by-同舟云学术

Precision micro-/nano-machining in a scanning electron microscope by run-to-run control based on image feedbacks

Published:2009-04 Issue:4-6 Volume:86 Page:1162-1168
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Liao Lun-De,Chao Paul C.-P.,Lin Yu-Jhu,Chiu Chi-Wei,Miaou Shaou-Gang,Chang Ming,Huang Jeng-Sheng

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

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4. An-Zhi Su, Off-line Application of Run-to-Run Control for Chemical Mechanical Polishing, Master Thesis, Department of Chemical and Materials Engineering, Chang Gung University, 2003.

5. Jr-Min Fan, Ruey-Shan Guo, Shi-Chung Chang, Jim-Huei Lee, Abnormal trend, detection of sequence-disordered data using EWMA method, in: IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1996.

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