Electrostatic chuck for EUV masks-Reference-Cited by-同舟云学术

Electrostatic chuck for EUV masks

Published:2006-04 Issue:4-9 Volume:83 Page:714-717
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kalkowski Gerhard,Risse Stefan,Müller Sandra,Harnisch Gerd

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. International Technology Roadmap for Semiconductors, 2004 update. Available from: .

2. L. Landau, E. Lifschitz, Theoretical Physics (German issue), vol. 7, paragraph 12, Akademie-verlag-Berlin, 1989.

3. Effect of electrostatic chucking on EUVL mask flatness

4. SEMI P40-1103 Specification for EUV Mask Substrate Chucking, issue 2003. Available from: .

5. ULE and ZERODUR are trademarks of CORNING and SCHOTT, respectively.

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