Recent improvements in the integration of field emitters into scanning probe microscopy sensors-Reference-Cited by-同舟云学术

Recent improvements in the integration of field emitters into scanning probe microscopy sensors

Published:2008-05 Issue:5-6 Volume:85 Page:1135-1138
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Beuer S.,Rommel M.,Petersen S.,Amon B.,Sulzbach Th.,Engl W.,Bauer A.J.,Ryssel H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Focused-ion-beam assisted fabrication of individual multiwall carbon nanotube field emitter

2. Carbon nanotube field emitter arrays having an electron beam focusing structure

3. C. Kimura, M. Yukawa, H. Aoki, Y. Morihisa, T. Kobayashi, R. Fushimi, S. Hayashi, J. Lee, H. Mori, T. Sugino, in: Conference Paper, 19th IFES and 50th IVMC, 2006, p. 323.

4. Optimization of Pt tip field emitter array fabricated using focused ion and electron beams

5. Integration of field emitters into scanning probe microscopy sensors using focused ion and electron beams

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1. Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA;Microelectronic Engineering;2011-08

2. Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-05

3. Complex nanostructures in PMMA made by a single process step using e-beam lithography;Microelectronic Engineering;2010-05