Full wafer microlens replication by UV imprint lithography-Reference-Cited by-同舟云学术

Full wafer microlens replication by UV imprint lithography

Published:2010-05 Issue:5-8 Volume:87 Page:1074-1076
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Schmitt H.,Rommel M.,Bauer A.J.,Frey L.,Bich A.,Eisner M.,Voelkel R.,Hornung M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Status and prospects of UV-Nanoimprint technology

2. R. Voelkel, J. Duparre, F. Wippermann, P. Dannberg, A. Bräuer, R. Zoberbier, M. Gabriel, M. Hornung, S. Hansen, R. Suess, Technology Trends of Microlens Imprint Lithography and Wafer Level Cameras (WLC), MOC’08, Brussels, 2008.

3. J. Weixlberger, J. van Eekelen, in: SCIL – A Novel Nanoimprint Technology for Large Area Applications, Poster Presented at 34th International Conference on Micro and Nanoengineering, Athens, 2008.

4. R. Voelkel, K.J. Weible, M. Eisner, Micro-Optics Fabrication and Applications, ODF’08, Taipei, 2008.

5. Custom-specific UV nanoimprint templates and life-time of antisticking layers

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